Development of titanium nitride thin film microheaters using laser micromachining
Authors:
- M.A. JithinMJM.A. Jithin
- K.L. GanapathiKGK.L. Ganapathi
- M. AmbreshMAM. Ambresh
- Pavan NukalaPNPavan Nukala
- N.K. UdayashankarNUN.K. Udayashankar
- S. MohanSMS. Mohan
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Laser nano-manufacturing – State of the art and challengesCIRP Annals, 2011
- Characterization of pulsed dc magnetron sputtering plasmasNew Journal of Physics, 2005
- Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin filmsSurface and Coatings Technology, 2005
- Thermal stability of titanium nitride diffusion barrier films for advanced silver interconnectsMicroelectronic Engineering, 2004
- Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited by RF reactive sputteringSurface and Coatings Technology, 2000
- Characterization of titanium nitride films prepared by d.c. reactive magnetron sputtering at different nitrogen pressuresSurface and Coatings Technology, 1997
- Schottky barrier contacts of titanium nitride on n-type siliconApplied Physics Letters, 1995
- TiN coating of tool steels: a reviewJournal of Materials Processing Technology, 1993
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- TiN coatings on steelThin Solid Films, 1981