Porphyrin Deposition Induced by UV Irradiation
- 30 January 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 125 (8) , 2040-2041
Abstract
Simple irradiation by UV light of porphyrin TpyP and its zinc(II) and manganese(III) metal derivatives in chlorinated solvents leads to the deposition on silica of mesoscale aggregates. The process is due to the photochemical decomposition of the solvent with generation of HCl, which causes the precipitation of a protonated form. The morphology of the resulting objects is driven by the nature of the inserted metal ion.Keywords
This publication has 8 references indexed in Scilit:
- Lithographic Imaging Techniques for the Formation of Nanoscopic FeaturesChemical Reviews, 1999
- Experimental Evidence for Self-Similar Structures in the Aggregation of Porphyrins in Aqueous SolutionsPhysical Review Letters, 1996
- Porphyrin WheelsJournal of the American Chemical Society, 1996
- Self-Organization of Amphiphilic Porphyrins at the Air-Water InterfaceLangmuir, 1995
- The Quantum Mechanics of Larger Semiconductor Clusters ("Quantum Dots")Annual Review of Physical Chemistry, 1990
- Aggregation of Porphyrins and Metalloporphyrins1978
- The molecular and crystal structure of porphyrin diacidsJournal of the American Chemical Society, 1968
- Benzene Photosensitized Decomposition of ChloroformNature, 1963