Magnetic field gradient-controlled plasma tuning in capacitively coupled discharges via electron beam injection
Open Access
- 14 November 2025
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 138 (18)
Abstract
This study employs 1D particle-in-cell/Monte Carlo collision simulations to systematically investigate the modulation of capacitively coupled plasma by a unidirectional electron beam under tunable magnetic field gradients. The results reveal a remarkable sensitivity of electron beam injection to both the orientation and intensity of the magnetic field gradient, enabling precise tailoring of plasma properties. Critically, the contribution of injected electrons to the discharge is maximized when their cyclotron radius matches the electrode gap, yielding peak plasma density. Furthermore, while ion bombardment energy remains stable under optimal beam injection, the ion flux exhibits significant modulation, demonstrating a decoupling between energy and flux control. These findings establish magnetic field gradients as a powerful tool for real-time plasma tuning in applications requiring dynamic control of density and ion flux.Keywords
Funding Information
- National Natural Science Foundation of China (12005136)
- National Natural Science Foundation of China (12105054)
- Natural Science Foundation of Shanghai Municipality (25ZR1402399)
This publication has 49 references indexed in Scilit:
- On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical groundPlasma Processes and Polymers, 2019
- Electron energy probability function modulation with external electron beam in capacitive coupled radio frequency dischargesPlasma Processes and Polymers, 2017
- Observations of Surface Mode Influence on Plasma Uniformity in PIC/MCC Simulations of Large Capacitive DischargesPlasma Processes and Polymers, 2016
- Role of transverse magnetic field in the capacitive dischargeThin Solid Films, 2011
- Gap length effect on electron energy distribution in capacitive radio frequency dischargesApplied Physics Letters, 2007
- Combined rf and transport effects in magnetized capacitive dischargesJournal of Applied Physics, 2006
- Numerical simulation of dual frequency etching reactors: Influence of the external process parameters on the plasma characteristicsJournal of Applied Physics, 2005
- Electron acceleration resonant with sheath motion in a low-pressure radio frequency dischargeApplied Physics Letters, 1994
- Direct implicit large time-step particle simulation of plasmasJournal of Computational Physics, 1983
- Implicit time integration for plasma simulationJournal of Computational Physics, 1982