Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiCN:H Films with Different Hydrogen Contents

Authors:
  • CCChiu-Chih Chiang
    Chiu-Chih Chiang
  • MCMao-Chieh Chen
    Mao-Chieh Chen
  • CKChung-Chi Ko
    Chung-Chi Ko
  • SJSyun-Ming Jang
    Syun-Ming Jang
  • CYChen-Hua Yu
    Chen-Hua Yu
  • MLMong-Song Liang
    Mong-Song Liang
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