Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications
Authors:
- Seungmin YeoSYSeungmin Yeo
- Dip K. NandiDNDip K. Nandi
- R. RahulRRR. Rahul
- Tae Hyun KimTKTae Hyun Kim
- Bonggeun ShongBSBonggeun Shong
- Yujin JangYJYujin Jang
- Jong-Seong BaeJBJong-Seong Bae
- Jeong Woo HanJHJeong Woo Han
- Soo-Hyun KimSKSoo-Hyun Kim
- Hyungjun KimHyungjun Kim
- 1 November 2018
- journal article
- research article
- Published by Elsevier in Applied Surface Science
- Vol. 459, 596-605
Abstract
No abstract availableKeywords
This publication has 48 references indexed in Scilit:
- Comparative study on MoS2 and WS2 for electrocatalytic water splittingInternational Journal of Hydrogen Energy, 2013
- Metal‐sulfide assisted rapid crystallization of highly (001)‐textured tungsten disulphide (WS2) films on metallic back contactsPhysica Status Solidi (a), 2011
- Accurate Molecular Van Der Waals Interactions from Ground-State Electron Density and Free-Atom Reference DataPhysical Review Letters, 2009
- Growth, structure, and tribological behavior of atomic layer-deposited tungsten disulphide solid lubricant coatings with applications to MEMSActa Materialia, 2006
- Atomic layer deposition of tungsten disulphide solid lubricant thin filmsJournal of Materials Research, 2004
- Fullerene‐like WS2 Nanoparticles: Superior Lubricants for Harsh ConditionsAdvanced Materials, 2003
- Generalized Gradient Approximation Made SimplePhysical Review Letters, 1996
- Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis setPhysical Review B, 1996
- Projector augmented-wave methodPhysical Review B, 1994
- Crystal structures of tungsten disulfide and diselenideJournal of Solid State Chemistry, 1987