Thermal annealing of SiC thin films with varying stoichiometry
Authors:
- Matthias KuenleMKMatthias Kuenle
- Klaus-Georg NickelKNKlaus-Georg Nickel
- 1 March 2009
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 159-160, 355-360
Abstract
No abstract availableKeywords
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