The Technology of Plasma Spray Physical Vapour Deposition
Open Access
- 21 February 2013
- journal article
- research article
- Published by Walter de Gruyter GmbH in High Temperature Materials and Processes
- Vol. 32 (1) , 33-39
Abstract
The article presents a new technology of thermal barrier coating deposition called Plasma Spray – Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.Keywords
This publication has 6 references indexed in Scilit:
- Plasma Spray-PVD: A New Thermal Spray Process to Deposit Out of the Vapor PhaseJournal of Thermal Spray Technology, 2011
- High-growth rate YSZ thermal barrier coatings deposited by MOCVD demonstrate high thermal cycling lifetimeMaterials Science and Engineering: A, 2011
- Columnar-Structured Thermal Barrier Coatings (TBCs) by Thin Film Low-Pressure Plasma Spraying (LPPS-TF)Journal of Thermal Spray Technology, 2010
- Vapor Phase Deposition Using Plasma Spray-PVD™Journal of Thermal Spray Technology, 2009
- Technical and Economical Aspects of Current Thermal Barrier Coating Systems for Gas Turbine Engines by Thermal Spray and EBPVD: A ReviewJournal of Thermal Spray Technology, 2008
- Characterization of Commercial EB‐PVD TBC Systems with CVD (Ni,Pt)Al Bond Coatings2001