Novel Cleaning Methodology for Steel Substrates in Microelectronic Fabrication
Authors:
- 1 January 2002
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 149 (2) , G143-G146
Abstract
We report on the development of a novel cleaning methodology for use with steel substrates in microelectronic fabrication. The statistical experimental design that was employed to identify the most significant factors in removing particles is presented and the effectiveness of the resulting clean formulation is detailed. © 2002 The Electrochemical Society. All rights reserved.Keywords
This publication has 2 references indexed in Scilit:
- Poly-Si thin-film transistors on steel substratesIEEE Electron Device Letters, 2000
- Amorphous silicon thin-film transistors on steel foil substratesIEEE Electron Device Letters, 1996