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Thermal Oxidation of Silicon: In Situ Measurement of the Growth Rate Using Ellipsometry
Home
Publications
Thermal Oxidation of Silicon: In Situ Measurement of the Growth Rate Using Ellipsometry
Thermal Oxidation of Silicon: In Situ Measurement of the Growth Rate Using Ellipsometry
Authors:
MH
M. A. Hopper
M. A. Hopper
RC
R. A. Clarke
R. A. Clarke
LY
L. Young
L. Young
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1 September 1975
journal article
Published by
The Electrochemical Society
in
Journal of the Electrochemical Society
Vol. 122
(9)
,
1216-1222
DOI:
10.1149/1.2134428
Abstract
No abstract available
Cited
Cited by 128 articles
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