Influence of tensile-strain-induced oxygen deficiency on metal-insulator transitions in NdNiO3−δ epitaxial thin films

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Abstract
We report direct evidence that oxygen vacancies affect the structural and electrical parameters in tensile-strained NdNiO3−δ epitaxial thin films by elaborately adjusting the amount of oxygen deficiency (δ) with changing growth temperature TD. The modulation in tensile strain and TD tended to increase oxygen deficiency (δ) in NdNiO3−δ thin films; this process relieves tensile strain of the thin film by oxygen vacancy incorporation. The oxygen deficiency is directly correlated with unit-cell volume and the metal-insulator transition temperature (TMI), i.e., resulting in the increase of both unit-cell volume and metal-insulator transition temperature as oxygen vacancies are incorporated. Our study suggests that the intrinsic defect sensitively influences both structural and electronic properties, and provides useful knobs for tailoring correlation-induced properties in complex oxides.

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