Characterisation of TiO2 deposited by photo-induced chemical vapour deposition
Authors:
- Never KaliwohNKNever Kaliwoh
- Jun-Ying ZhangJZJun-Ying Zhang
- Ian W. BoydIBIan W. Boyd
- 1 January 2002
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 186 (1-4) , 241-245
Abstract
No abstract availableKeywords
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