Microstructure development during the thermal oxidation of silicon in chlorine containing ambients
Authors:
- M.D. MonkowskiMMM.D. Monkowski
- J.R. MonkowskiJMJ.R. Monkowski
- I.S.T. TsongITI.S.T. Tsong
- J. StachJSJ. Stach
- R.E. TresslerRTR.E. Tressler
- 1 May 1982
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 49 (1-3) , 201-207
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Phase Separation and Sodium Passivation in Silicon Oxides Grown in HCl / O 2 AmbientsJournal of the Electrochemical Society, 1979
- Chlorine Incorporation in HCl OxidesJournal of the Electrochemical Society, 1979
- The Structure and Composition of Silicon Oxides Grown in HCl / O 2 AmbientsJournal of the Electrochemical Society, 1978