Fabrication of TiN/Si3N4 Ceramics by Spark Plasma Sintering of Si3N4 Particles Coated with Nanosized TiN Prepared by Controlled Hydrolysis of Ti(O‐i‐C3H7)4

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Abstract
TiN‐coated Si3N4 particles were prepared by depositing TiO2 on the Si3N4 surfaces from Ti(O‐i‐C3H7)4 solution, the TiO2 being formed by controlled hydrolysis, then subsequently nitrided with NH3 gas. A homogeneous TiO2 coating was achieved by heating a Si3N4 suspension containing 1.0 vol% H2O with the precursor at 40°C. Nitridation successfully produced Si3N4 particles coated with 10–20 nm TiN particles. Spark plasma sintering of these TiN/Si3N4 particles at 1600°C yielded composite ceramics with a relative density of 96% at 25 vol% TiN and an electrical resistivity of 10−3Ω·cm in compositions of 17.5 and 25 vol% TiN/Si3N4, making these ceramics suitable for electric discharge machining.

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