Laplacian Multifractality of the Growth Probability Distribution in Electrodeposition
Authors:
- J MachJMJ Mach
- F MasFMF Mas
- F SaguésFSF Sagués
- 1 February 1994
- journal article
- Published by IOP Publishing in Europhysics Letters
- Vol. 25 (4) , 271-276
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- Some effects of cell dimensions on zinc electrodepositsJournal of Electroanalytical Chemistry, 1992
- Growth Velocity, the Limiting Current, and Morphology Selection in Electrodeposition of Branched AggregatesJournal of the Electrochemical Society, 1992
- Morphology Selection and the Concentration Boundary Layer in Electrochemical DepositionJournal of the Electrochemical Society, 1991
- Pattern morphologies in zinc electrodepositionJournal of Electroanalytical Chemistry and Interfacial Electrochemistry, 1991
- Geometrical aspect of electrodeposition: The Hecker effectPhysical Review A, 1991
- Growth rate of fractal copper electrodeposits: Potential and concentration effectsPhysical Review A, 1991
- Interfacial Velocity in Electrochemical Deposition and the Hecker TransitionPhysical Review Letters, 1990
- Electrochemical aspects of the generation of ramified metallic electrodepositsPhysical Review A, 1990
- Laplace- and diffusion-field-controlled growth in electrochemical depositionPhysical Review Letters, 1989
- Nonlinear oscillations in electrochemical growth of Zn dendritesPhysical Review B, 1989