Approach for dislocation free GaN epitaxy
- 1 October 2010
- journal article
- research article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 312 (21) , 3143-3146
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Array of Two UV-Wavelength Detector TypesIEEE Transactions on Electron Devices, 2010
- Resolving the Burgers vector for individual GaN dislocations by electron channeling contrast imagingScripta Materialia, 2009
- Nondestructive analysis of threading dislocations in GaN by electron channeling contrast imagingApplied Physics Letters, 2007
- Improved GaN materials and devices through confined epitaxyApplied Physics Letters, 2007
- Approaches to Reduced-Defect Active Regions for III-N DevicesECS Transactions, 2006
- Minimizing threading dislocations by redirection during cantilever epitaxial growth of GaNApplied Physics Letters, 2002
- Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO)Journal of Crystal Growth, 2000
- Pendeoepitaxy of gallium nitride thin filmsApplied Physics Letters, 1999
- Dislocation density reduction via lateral epitaxy in selectively grown GaN structuresApplied Physics Letters, 1997
- Anisotropic epitaxial lateral growth in GaN selective area epitaxyApplied Physics Letters, 1997