Imaging the irradiance distribution in the optical near field
Authors:
- 29 December 1997
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 71 (26) , 3773-3775
Abstract
This letter describes the use of a sensitive photoresist for direct imaging of optical intensity profiles in near-field photolithographic experiments. A comparison between experimental patterns in exposed, developed photoresist and calculated profiles of intensity shows that this procedure provides a reliable semiquantitative image of the irradiance distribution in the near field; experiment and theory correlate adequately. A potential use of the superficial diffraction contrast recorded in photoresist as the basis for a new method of the fabrication of nanostructures is discussed.Keywords
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