Post-breakdown electrical characterization of ultrathin SiO2 films with conductive atomic force microscopy
Authors:
- M PortiMPM Porti
- M NafríaMNM Nafría
- X AymerichXAX Aymerich
- A OlbrichAOA Olbrich
- B EbersbergerBEB Ebersberger
- 24 May 2002
- journal article
- Published by IOP Publishing in Nanotechnology
- Vol. 13 (3) , 388-391
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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