Demagnified projection printing by a new x-ray lithographic technique using no thin-film masks
Authors:
- 1 July 1984
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 45 (1) , 3-5
Abstract
A new x‐ray lithographic technique using no thin‐film pattern masks is presented. A pattern image is projected by utilizing the total reflection of the x ray from a pattern plate, in which a pattern picture is drawn on a thick and hard substrate. The projected image is geometrically demagnified by the sine of incident angle of the x ray. And we actually succeeded in obtaining the demagnified line and space patterns of 1.9‐μm width from the similar patterns of 210 μm by using copper Kα x ray.Keywords
This publication has 2 references indexed in Scilit:
- Silicon Nitride Single-Layer X-Ray MaskJapanese Journal of Applied Physics, 1981
- High-Resolution Thick Mask Pattern Fabrication for X-Ray LithographyJapanese Journal of Applied Physics, 1980