Photoelectric Yields for Oblique Incidence of Extreme Ultraviolet Radiation*
Authors:
- L. HerouxLHL. Heroux
- J. E. MansonJMJ. E. Manson
- H. E. HintereggerHHH. E. Hinteregger
- W. J. McMahonWMW. J. McMahon
- 1 January 1965
- journal article
- Published by Optica Publishing Group in Journal of the Optical Society of America
- Vol. 55 (1) , 103-104