Plasma enhanced CVD of fluorocarbon films by low-pressure dielectric barrier discharge
Authors:
- Dongping LiuDLDongping Liu
- Wei LiWLWei Li
- Zhiqing FengZFZhiqing Feng
- Xiaodong TanXTXiaodong Tan
- Baoxiang ChenBCBaoxiang Chen
- Jinhai NiuJNJinhai Niu
- Yanhong LiuYLYanhong Liu
- 25 January 2009
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 203 (9) , 1231-1236
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
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