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Chlorine-enhanced F-atom etching of silicon
Home
Publications
Chlorine-enhanced F-atom etching of silicon
Chlorine-enhanced F-atom etching of silicon
Author:
JC
J. W. Coburn
J. W. Coburn
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1 May 1994
journal article
Published by
American Vacuum Society
in
Journal of Vacuum Science & Technology A
Vol. 12
(3)
,
617-619
DOI:
10.1116/1.578845
Abstract
No abstract available
Cited
Cited by 13 articles
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