Ferroelectric Films Deposited by Reactive Sputtering and Their Properties

Authors:
  • TFTatsuo Fukami
    Tatsuo Fukami
  • TSToshiyuki Sakuma
    Toshiyuki Sakuma
  • KTKazuo Tokunaga
    Kazuo Tokunaga
  • HTHidetoshi Tsuchiya
    Hidetoshi Tsuchiya
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Abstract
Thin films of ferroelectric materials (PZT and PLZT) have been deposited by dc reactive co-sputtering from composite metal target. Although the structure of the resulting films without substrate heating was proved as amorphous through X-ray diffraction, it can be changed to provide a desired perovskite structure by subsequent heat-treatment in a lead-compensated atomosphere. Some of the films, after poling in the planar direction, showed an obvious piezoelectric activity.