Epitaxial silicon growth on porous silicon by reduced pressure, low temperature chemical vapour deposition
Authors:
- C. OulesCOC. Oules
- R. HerinoRHR. Herino
- 31 October 1989
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 4 (1-4) , 435-439
Abstract
No abstract availableKeywords
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