Effect on Al2O3 Doping Concentration of RF Magnetron Sputtered ZnO:Al Films for Solar Cell Applications
Authors:
- Chaehwan JeongCJChaehwan Jeong
- Ho-Sung KimHKHo-Sung Kim
- Duck-Rye ChangDCDuck-Rye Chang
- 1 July 2008
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 47 (7R)
Abstract
No abstract availableKeywords
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