Increased optical damage resistance in lithium niobate

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Abstract
We have confirmed greatly improved resistance to photorefractive damage in compositions of lithium niobate containing 4.5 at. % MgO or more. Holographic diffraction measurements of photorefraction demonstrated that the improved performance is due to a hundredfold increase in the photoconductivity, rather than a decrease in the Glass current. The diffraction efficiency shows an Arrhenius dependence on temperature, with an activation energy of 0.1 eV for the damage-resistant compositions, compared with 0.5 eV for undoped or low-magnesium compositions. The damage-resistant compositions are distinguished by a 2.83-μm absorption line instead of the usual 2.87-μm line due to the OH-stretch vibration.