Low-Temperature Polycrystalline Silicon Thin-Film Transistors and Circuits on Flexible Substrates

Authors:
  • PWP.C. van der Wilt
    P.C. van der Wilt
  • MKM.G. Kane
    M.G. Kane
  • ALA.B. Limanov
    A.B. Limanov
  • AFA.H. Firester
    A.H. Firester
  • LGL. Goodman
    L. Goodman
  • JLJ. Lee
    J. Lee
  • ACA.M. Chitu
    A.M. Chitu
  • JIJames S. Im
    James S. Im

Abstract
Low-defect-density polycrystalline Si on flexible substrates can be instrumental in realizing the full potential of macroelectronics. Direct deposition or solid-phase crystallization techniques are often incompatible with polymers and produce materials with high defect densities. Excimer-laser annealing is capable of producing films of reasonable quality directly on polymer and metallic substrates. Sequential lateral solidification (SLS) is an advanced pulsed-laser-crystallization technique capable of producing Si films on polymers with lower defect density than can be obtained via excimer-laser annealing. Circuits built directly on polymers using these SLS films show the highest performance reported to date.

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