The Physical Basis for Quantitative Surface Analysis by Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy
Author:
- 1 January 1978
- book chapter
- Published by ASTM International
- p. 5-30
Abstract
A review is given of the physical basis for quantitative surface analysis by Auger electron spectroscopy (AES) and by X-ray photoelectron spectroscopy (XPS) or electron spectroscopy for chemical analysis (ESCA). The principal topics discussed are: the feasibility of surface analysis, approaches to surface analysis, description of models and data for surface analysis by AES and XPS, analytical methods, intensity measurements, practical considerations, applications, and reference materials.Keywords
This publication has 94 references indexed in Scilit:
- Angular effects in Auger electron emission from Cu (110)Solid State Communications, 1976
- A method of background determination in quantitative auger spectroscopyApplied Physics A, 1976
- Auger current measurements for quantitative Auger electron spectroscopy of solidsJournal of Colloid and Interface Science, 1976
- ESCA and the quantitative analysis of metallic systemsJournal of Inorganic and Nuclear Chemistry, 1976
- Engineering properties and slope form in granular soilsEngineering Geology, 1975
- ESCA - a new took for surface researchAdvances in Colloid and Interface Science, 1975
- Photoelectron and Auger Spectroscopy1975
- Absolute atomic densities determined by auger electron spectroscopyApplied Physics A, 1974
- Electron Energy Loss during PhotoemissionPhysica Status Solidi (b), 1973
- Analogies between quantitative X‐ray fluorescence analysis (XRFA) and quantitative X‐ray photoelectron spectrometry (XPS)X-Ray Spectrometry, 1973