Alternative method to fabricate microdevices on a freestanding Si3N4 window
Authors:
- 24 May 2017
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 35 (4)
Abstract
In this paper, the authors introduced a novel method for the fabrication of microdevices on freestanding Si3N4 thin-film windows with a single-side mask aligner. A thin-film microdevice located on the front surface of such a freestanding window was demonstrated, where the backside of Si wafer was performed with KOH wet etching. The results showed that an alignment error could be controlled in condition less than 20 μm. By using the freestanding device, a weak change in local temperature under an e-beam in a scanning electron microscope (FEI QUANTA 600F) was detected with better sensitivity.Keywords
Funding Information
- MOST of China (2016YFA0200800)
- NFS of China (11374016)
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