Development and Benchmarking of Multivariate Statistical Process Control Tools for a Semiconductor Etch Process: Improving Robustness through Model Updating
Authors:
- Neal B. GallagherNGNeal B. Gallagher
- Barry M. WiseBWBarry M. Wise
- Stephanie Watts ButlerSBStephanie Watts Butler
- Daniel D. WhiteDWDaniel D. White
- Gabriel G. BarnaGBGabriel G. Barna
- 1 June 1997
- journal article
- Published by Elsevier in IFAC Proceedings Volumes
- Vol. 30 (9) , 79-84
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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