Flash X‐ray microscopy with a gas jet plasma source
Authors:
- 1 September 1984
- journal article
- research article
- Published by Wiley in Journal of Microscopy
- Vol. 135 (3) , 347-351
Abstract
SUMMARY: A novel flash X‐ray source, the gas jet plasma source, has been used for contact X‐ray microscopy. Using a wavelength range of 2–7 nm a resolution of the order of 30 nm can be obtained. The gas jet plasma source provides a new and unique tool which should allow future imaging of wet live cells.Keywords
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