Titanium dioxide thin films prepared by chemical vapor deposition
Authors:
- Toshiro MaruyamaTMToshiro Maruyama
- Susumu AraiSASusumu Arai
- 1 May 1992
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 26 (4) , 323-329
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
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- A simple method for the determination of the optical constants n, k and the thickness of a weakly absorbing thin filmJournal of Physics E: Scientific Instruments, 1976
- Thin films of metal oxides on silicon by chemical vapor deposition with organometallic compounds. IJournal of Crystal Growth, 1972