Measurement Noise in Profile Metrology: Concepts, Characterization, and Metrological Implication
Preprint
- 10 October 2026
- preprint
- Published by MDPI AG in Preprints.org
Abstract
Measurement noise is an important limiting factor in high-accuracy surface texture metrology. Although standardized procedures for noise characterization exist for areal surface topography measurements, no equivalent comprehensive framework is currently available for profile measurements. This review examines measurement noise in contact stylus profile metrology, focusing on its metrological interpretation, characterization methods, and implications for measurement uncertainty. The terminology and relationships between basic, static, dynamic, instrument, and measurement noise are examined within the relevant normative framework. Noise characterization methods are reviewed, including amplitude measures, subtraction and averaging procedures, autocorrelation, and power spectral density analysis. Particular attention is given to the applicability of procedures established within the ISO 25178 framework to profile measurements. The analysis indicates that these principles can be transferred to profile data, providing a basis for comprehensive noise characterization and its consistent inclusion in uncertainty evaluation for high-accuracy contact stylus profile metrology.Keywords
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