Ge quantum dots light-emitting devices
Authors:
- 3 January 2012
- journal article
- Published by Higher Education Press in Frontiers of Optoelectronics
- Vol. 5 (1) , 13-20
Abstract
Si photonics becomes one of the research focuses in the field of photonics. Si-based light-emitting devices are one of the most important devices in this field. In this paper, we review the Si-based light-emitting devices fabricated by embedding Ge self-assembled quantum dots into optical microcavities. Ge self-assembled quantum dots emit light in the telecommunication wavelength range from 1.3 to 1.6 μm, for which Si is transparent. Ge self-assembled quantum dots were grown on silicon-oninsulator (SOI) by molecular beam epitaxy (MBE) in Stranski-Krastanov (S-K) mode. Then, electron beam lithography (EBL) was used to define the pattern of optical microcavities on the wafer. Finally, the pattern was transferred onto the Si/Ge slab by inductive coupled plasma (ICP) dry etching. Room-temperature photoluminescence (PL) was used to characterize the light-emitting properties of fabricated devices. The results showed that strong resonant light emission was observed in different optical microcavities. Significant enhancement of the intensity was obtained by the optical resonance. Based on the results of PL, we designed and fabricated current-injected light-emitting devices based on Ge self-assembled quantum dots in optical microcavities. Room-temperature resonant light emission was observed from Ge dots in a 3.8 μm microdisk resonator.Keywords
This publication has 29 references indexed in Scilit:
- Generation and Wavelength Control of Resonant Luminescence from Silicon Photonic Crystal Microcavities with Ge DotsJapanese Journal of Applied Physics, 2009
- Resonant photoluminescence from Ge self-assembled dots in optical microcavitiesJournal of Crystal Growth, 2009
- Ge islands and photonic crystals for Si-based photonicsOptical Materials, 2005
- Optical Properties of Strain-Balanced Si0.73Ge0.27Planar Microcavities on Si SubstratesJapanese Journal of Applied Physics, 2002
- Fabrication of strain-balanced Si0.73Ge0.27/Si-distributed Bragg reflectors on Si substrates for optical device applicationsPhysica E: Low-dimensional Systems and Nanostructures, 2002
- Intersubband Electroluminescence from Silicon-Based Quantum Cascade StructuresScience, 2000
- Gas-source molecular beam epitaxy and luminescence characterization of strained Si1−xGex/Si quantum wellsJournal of Crystal Growth, 1994
- Electroluminescence from Strained SiGe/Si Quantum Well Structures Grown by Solid Source Si Molecular Beam EpitaxyJapanese Journal of Applied Physics, 1992
- Inhibited Spontaneous Emission in Solid-State Physics and ElectronicsPhysical Review Letters, 1987
- Resonance Absorption by Nuclear Magnetic Moments in a SolidPhysical Review B, 1946