Discrete tunneling current fluctuations in metal–water–metal tunnel junctions
Authors:
- 15 May 2003
- journal article
- conference paper
- Published by AIP Publishing in The Journal of Chemical Physics
- Vol. 118 (19) , 8891-8897
Abstract
We have studied electron tunneling through water between two metal electrodes supported on a solid substrate and observed random fluctuations in the tunneling current between two discrete levels. The two-level fluctuations persist when changing the concentration and the valency of the ions, and pH of the water solutions. A given two-level fluctuation is, in general, not affected by the applied bias voltage, but it is usually disrupted by changing the width of the tunnel gap. We attribute the discrete conductance fluctuations to random trapping or escaping of a single electron in or from a localized state in the tunnel gap.Keywords
This publication has 31 references indexed in Scilit:
- Ultrafast Dynamics of Electron Localization and Solvation in Ice Layers on Cu(111)Physical Review Letters, 2002
- Femtosecond Dynamics of Electron Localization at InterfacesScience, 1998
- Tunneling mechanisms in electrochemical STM —distance and voltage tunneling spectroscopyElectrochimica Acta, 1995
- Non-exponential tunneling in water near an electrodeChemical Physics Letters, 1995
- Adatom diffusion characteristics from STM noise: theorySurface Science, 1994
- Tunneling Barriers in Electrochemical Scanning Tunneling MicroscopyThe Journal of Physical Chemistry, 1994
- Noise in STM due to atoms moving in the tunneling spacePhysical Review B, 1993
- Ordering of liquid water at metal surfaces in tunnel junction devicesThe Journal of Physical Chemistry, 1993
- Electrolytic scanning tunneling microscopy and point contact studies at electrochemically polished Au(111) substrates with and without Pb adsorbatesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1991
- Extensions of the field-emission fluctuation method for the determination of surface diffusion coefficientsApplied Physics A, 1986