Control of optical bandgap energy and optical absorption coefficient by geometric parameters in sub-10 nm silicon-nanodisc array structure

Authors:
  • WHWeiguo Hu
    Weiguo Hu
  • MIMakoto Igarashi
    Makoto Igarashi
  • RTRikako Tsukamoto
    Rikako Tsukamoto
  • TITaiga Isoda
    Taiga Isoda
  • KIKohei M Itoh
    Kohei M Itoh
  • IYIchiro Yamashita
    Ichiro Yamashita
  • AMAkihiro Murayama
    Akihiro Murayama
  • YOYoshitaka Okada
    Yoshitaka Okada

Abstract
A sub-10 nm, high-density, periodic silicon-nanodisc (Si-ND) array has been fabricated using a new top-down process, which involves a 2D array bio-template etching mask made of Listeria-Dps with a 4.5 nm diameter iron oxide core and damage-free neutral-beam etching (Si-ND diameter: 6.4 nm). An Si-ND array with an SiO(2) matrix demonstrated more controllable optical bandgap energy due to the fine tunability of the Si-ND thickness and diameter. Unlike the case of shrinking Si-ND thickness, the case of shrinking Si-ND diameter simultaneously increased the optical absorption coefficient and the optical bandgap energy. The optical absorption coefficient became higher due to the decrease in the center-to-center distance of NDs to enhance wavefunction coupling. This means that our 6 nm diameter Si-ND structure can satisfy the strict requirements of optical bandgap energy control and high absorption coefficient for achieving realistic Si quantum dot solar cells.

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