Diagnostics of a Chemically Active, Pulsed Microwave Plasma for Deposition of Quartz-like Films
Authors:
- 1 January 1999
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 39 (5) , 399-409
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Electron density measurements in a slot antenna microwave plasma source by means of the plasma oscillation methodPlasma Sources Science and Technology, 1999
- Experimental and Theoretical Studies of a Pulsed Microwave Excited Ar/CF4 PlasmaPlasma Chemistry and Plasma Processing, 1998
- Scaling of microwave slot antenna (SLAN): a concept for efficient plasma generationPlasma Sources Science and Technology, 1996
- Global models of pulse-power-modulated high-density, low-pressure dischargesPlasma Sources Science and Technology, 1996
- Determination of chemically active species in a novel microwave plasma source by laser-induced fluorescenceJournal of Vacuum Science & Technology A, 1996
- Characterization of a microwave plasma by in situ diagnosticsSurface and Coatings Technology, 1995
- Diagnostics and control of radicals in an inductively coupled etching reactorJournal of Vacuum Science & Technology A, 1995
- Spatially and temporally resolved absolute O-atom concentrations in etching plasmasJournal of Applied Physics, 1995
- Slot antenna 2.45 GHz microwave plasma sourcePlasma Sources Science and Technology, 1994
- Thin film deposition in glow discharges fed with hexamethyldisilazane-oxygen mixturesPlasma Sources Science and Technology, 1993