Growth and characterization of ultrathin nitrided silicon oxide films
Authors:
- E. P. GusevEGE. P. Gusev
- H.-C. LuHLH.-C. Lu
- E. L. GarfunkelEGE. L. Garfunkel
- T. GustafssonTGT. Gustafsson
- M. L. GreenMGM. L. Green
- 1 May 1999
- journal article
- Published by IBM in IBM Journal of Research and Development
- Vol. 43 (3) , 265-286