Vapor Deposition of TiO2
Authors:
- Masami YokozawaMYMasami Yokozawa
- Hitoo IwasaHIHitoo Iwasa
- Iwao TeramotoITIwao Teramoto
- 1 January 1968
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 7 (1)
Abstract
No abstract availableThis publication has 2 references indexed in Scilit:
- Titanium-dioxide dielectric films prepared by vapor reactionProceedings of the IEEE, 1964
- preparation, properties and optical applications of thin films of titanium dioxideVacuum, 1952