Abstract
One of the problems in the use of inorganic silica membranes is their instability against water or water vapor, a problem that results from the dissolution and rearrangements of silica networks. In this work Ni(NO3) · 6H2O was added to silica sol for fabrication of Ni‐doped silica membranes by sol‐gel techniques in order to prevent the densification of amorphous silica networks in a humid atmosphere at 50–300°C. A fresh Ni‐doped silica membrane (Si/Ni = 2/1) fired at 500°C showed a large He permeance of about 2.6 × 10−5 [m3 (STP)/(m2 · s · kPa)] with a selectivity of 600 (He/CH4) at 300°C. After the Ni‐doped silica membrane was left in humid air (40°C, 60% RH) for 4 days, the He permeance decreased slightly (by 5%) with a larger selectivity of 800 (He/CH4) at 300°C. However, little change was observed in the activation energy of He permeation, suggesting that nickel oxides added to silica can preferably prevent the densification of silica networks through which only H2 and He can permeate. Humid ...

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