Antireflection with Multilayer Structure Used on Silicon Solar Cell

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Abstract
The refractive index of silicon material is very high, and antireflection coatings are widely used to improve conversion efficiencies of silicon solar cells. An ideal antireflection structure should lead to zero reflection loss on its surfaces over an extended solar spectral range for all angles of incidence. Based on optical thin film theory, a multilayer structure are adopted as initial stack, and with the aid of conjugate graduate optimized method, a broadband and wide-angle antireflection is designed for using on silicon solar cell. In our design, the incident angles of antireflection coating are considered from to , working wavelength ranges are considered from 400nm to 1200nm. Within these ranges, the design results show that it can reduce residual reflection evidently in theory.

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