Towards high quality ITO coatings: The impact of nitrogen admixture in HiPIMS discharges
Authors:
- Vitezslav StranakVitezslav Stranak
- Robert BogdanowiczRobert Bogdanowicz
- Petr SezemskyPSPetr Sezemsky
- Harm WulffHWHarm Wulff
- Angela KruthAKAngela Kruth
- Mateusz SmietanaMSMateusz Smietana
- Jiri KratochvilJKJiri Kratochvil
- Martin CadaMCMartin Cada
- Zdenek HubickaZHZdenek Hubicka
- 1 February 2018
- journal article
- research article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 335, 126-133
Abstract
No abstract availableKeywords
Funding Information
- Grantová Agentura České Republiky (16-14024S)
- North Atlantic Treaty Organization (SPS G5147)
- Polish National Science Centre (NCN) (2016/21/B/ST7/01430, 2014/14/M/ST5/00715, 2014/14/E/ST7/00104)
- Politechnika Gdańska
This publication has 53 references indexed in Scilit:
- Past achievements and future challenges in the development of optically transparent electrodesNature Photonics, 2012
- Time‐Resolved Diagnostics of Dual High Power Impulse Magnetron Sputtering With Pulse Delays of 15 µs and 500 µsContributions to Plasma Physics, 2011
- Double hollow cathode plasma jet-low temperature method for the TiO2−N photoresponding filmsElectrochimica Acta, 2010
- High quality ITO thin films grown by dc and RF sputtering without oxygenJournal of Physics D: Applied Physics, 2010
- Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputteringPlasma Sources Science and Technology, 2009
- Probe Diagnostics of Microwave Plasma at Frequency 2.45 GHz in CW and Pulse RegimeContributions to Plasma Physics, 2006
- High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systemsScience and Technology of Advanced Materials, 2006
- ENERGY DEPENDENCE OF ION-INDUCED SPUTTERING YIELDS FROM MONATOMIC SOLIDS AT NORMAL INCIDENCEAtomic Data and Nuclear Data Tables, 1996
- High Conducting Large Area Indium Tin Oxide Electrodes for Displays Prepared by DC Magnetron SputteringJapanese Journal of Applied Physics, 1991
- Berechnung verschiedener physikalischer Konstanten von heterogenen Substanzen. I. Dielektrizitätskonstanten und Leitfähigkeiten der Mischkörper aus isotropen SubstanzenAnnalen der Physik, 1935