A semianalytic radio frequency sheath model integrated into a two-dimensional hybrid model for plasma processing reactors
Authors:
- 15 January 1997
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 81 (2) , 569-577
Abstract
In high plasma density ([e]>1011–1012 cm−3) reactors for materials processing, the sheath thickness is often 2 will be discussed. We found that the sheath voltage wave form remains nearly sinusoidal, and that the plasma density, and consequently the ion flux to the surface, scale primarily with inductively coupled power.Keywords
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