Silicon Oxide: A Non-innocent Surface for Molecular Electronics and Nanoelectronics Studies
- 22 December 2010
- journal article
- Published by American Chemical Society (ACS) in Journal of the American Chemical Society
- Vol. 133 (4) , 941-948
Abstract
Silicon oxide (SiO(x)) has been widely used in many electronic systems as a supportive and insulating medium. Here, we demonstrate various electrical phenomena such as resistive switching and related nonlinear conduction, current hysteresis, and negative differential resistance intrinsic to a thin layer of SiO(x). These behaviors can largely mimic numerous electrical phenomena observed in molecules and other nanomaterials, suggesting that substantial caution should be paid when studying conduction in electronic systems with SiO(x) as a component. The actual electrical phenomena can be the result of conduction from SiO(x) at a post soft-breakdown state and not the presumed molecular or nanomaterial component. These electrical properties and the underlying mechanisms are discussed in detail.Keywords
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This publication has 56 references indexed in Scilit:
- Negative differential resistance in hydrated deoxyribonucleic acid thin films mediated by diffusion-limited water redox reactionsApplied Physics Letters, 2010
- Two-Terminal Molecular Memories from Solution-Deposited C60 Films in Vertical Silicon NanogapsACS Nano, 2010
- Lithographic Graphitic MemoriesACS Nano, 2009
- Electronic two-terminal bistable graphitic memoriesNature Materials, 2008
- Graphene-Based Atomic-Scale SwitchesNano Letters, 2008
- Fabrication and characterization of metal-molecule-silicon devicesApplied Physics Letters, 2007
- Metal-free silicon–molecule–nanotube testbed and memory deviceNature Materials, 2005
- Nanowell device for the electrical characterization of metal–molecule–metal junctionsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2005
- Measuring Molecular Conductivities Using Single Molecular-Sized Gap Junctions Fabricated without Using Electron Beam LithographyJapanese Journal of Applied Physics, 2005
- NanoCell Electronic MemoriesJournal of the American Chemical Society, 2003