Thick photoresist development for the fabrication of high aspect ratio magnetic coils
Authors:
- Magali BrunetMBMagali Brunet
- Terence OaposDonnellTOTerence OaposDonnell
- Joe OaposBrienJOJoe OaposBrien
- Paul McCloskeyPMPaul McCloskey
- Seaacuten Cian Oacute MathunaSMSeaacuten Cian Oacute Mathuna
- 14 June 2002
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 12 (4) , 444-449
Abstract
No abstract availableKeywords
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