An original approach for the fabrication of Si/SiO2 multilayers using reactive magnetron sputtering
Authors:
- C TernonCTC Ternon
- F GourbilleauFGF Gourbilleau
- X PortierXPX Portier
- P VoivenelPVP Voivenel
- C DufourCDC Dufour
- 1 November 2002
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 419 (1-2) , 5-10
Abstract
No abstract availableKeywords
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