Deposition of Silver Thin Films Using the Pyrazolate Complex [Ag(3,5‐(CF3)2C3HN2)]3
- 25 April 2005
- journal article
- research article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 11 (4) , 206-212
Abstract
The synthesis and characterization of a series of silver pyrazolate complexes [Ag(tfpz)]3 (1), [Ag(fbpz)]3 (2), [Ag(dbpz)]3 (3), and [(py)Ag(tfpz)]2 (4) are reported, for which tfpz, fbpz, dbpz are abbreviations for the pyrazolate ligands with formulae 3,5‐(CF3)2‐pz, 3‐tBu‐5‐(CF3)‐pz, and 3,5‐(tBu)2‐pz, respectively. These silver complexes were characterized by microanalysis and spectroscopic methods. The CF3‐substituted complex 1 possesses the highest volatility and stability against thermal decomposition. Low pressure CVD experiments were conducted over the temperature range 250–350 °C. Silver metal thin films were successfully obtained on silicon wafers using pure H2 as the carrier gas. Scanning electron microscopy (SEM) was used to reveal surface morphologies, while X‐ray photoelectron spectroscopy (XPS) and X‐ray diffraction (XRD) were utilized to determine the atomic composition of the as‐deposited thin films as well as the crystallite packing.Keywords
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