Anomalous Grain Boundary Physics in Polycrystalline: The Existence of a Hole Barrier
Authors:
Top Cited Papers
- 24 December 2003
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 91 (26) , 266401
Abstract
First-principles modeling of grain boundaries (GB) in semiconductors reveals that an energetic barrier exists for holes arriving from the grain interior (GI) to the GB. Consequently, the absence of holes inside the GB prevents GB electrons from recombining. At the same time, the GI is purer in polymaterials than in single crystals, since impurities segregated to the GBs. This explains the puzzle of the superiority of polycrystalline solar cells over their crystalline counterpart. We identify a simple and universal mechanism for the barrier, arising from reduced repulsion due to Cu-vacancy surface reconstruction. This discovery opens up possibilities for the future design of superior polycrystalline devices.
Keywords
This publication has 22 references indexed in Scilit:
- Cathodoluminescence of Cu(In,Ga)Se2 thin films used in high-efficiency solar cellsApplied Physics Letters, 2003
- Properties of 19.2% efficiency ZnO/CdS/CuInGaSe2thin‐film solar cellsProgress in Photovoltaics: Research and Applications, 2003
- Direct evidence for grain-boundary depletion in polycrystalline CdTe from nanoscale-resolved measurementsApplied Physics Letters, 2003
- Defect-induced nonpolar-to-polar transition at the surface of chalcopyrite semiconductorsPhysical Review B, 2001
- Evidence for grain-boundary-assisted diffusion of sulfur in polycrystalline CdS/CdTe heterojunctionsApplied Physics Letters, 1999
- Phase segregation, Cu migration and junction formation in Cu(In, Ga)Se2The European Physical Journal Applied Physics, 1999
- Model for electronic transport in Cu(In,Ga)Se2 solar cellsProgress in Photovoltaics: Research and Applications, 1998
- Chalcopyrite/defect chalcopyrite heterojunctions on the basis of CuInSe2Journal of Applied Physics, 1993
- The electrical properties of polycrystalline silicon filmsJournal of Applied Physics, 1975
- Hall Mobility in Chemically Deposited Polycrystalline SiliconJournal of Applied Physics, 1971