Effect of DC electric field on the basic properties of RF plasma deposited a-Si
Authors:
- 1 January 1980
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 35-36, 201-206
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Effect of annealing on the optical properties of plasma deposited amorphous hydrogenated siliconSolar Energy Materials, 1979
- Optical and photoconductive properties of discharge-produced amorphous siliconJournal of Applied Physics, 1977
- Infrared and Raman spectra of the silicon-hydrogen bonds in amorphous silicon prepared by glow discharge and sputteringPhysical Review B, 1977
- Amorphous silicon solar cellsIEEE Transactions on Electron Devices, 1977
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976