Growth and characterization of Ta-doped Ga2O3 films deposited by magnetron sputtering
Authors:
- Yi ShangYSYi Shang
- Ke TangKTKe Tang
- Zhuorui ChenZCZhuorui Chen
- Zhiluo ZhangZZZhiluo Zhang
- Jie DengJDJie Deng
- Yan HuYHYan Hu
- Keyun GuKGKeyun Gu
- Meng CaoMCMeng Cao
- Linjun WangLWLinjun Wang
- Jian HuangJian Huang
- 1 November 2021
- journal article
- research article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 134
Abstract
No abstract availableKeywords
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