A review of the scalable nano-manufacturing technology for flexible devices
- 7 January 2017
- journal article
- review article
- Published by Springer Nature in Frontiers of Mechanical Engineering
- Vol. 12 (1) , 99-109
Abstract
No abstract availableKeywords
This publication has 71 references indexed in Scilit:
- RETRACTED ARTICLE: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric LithographyScientific Reports, 2015
- Robust Superhydrophobicity in Large‐Area Nanostructured Surfaces Defined by Block‐Copolymer Self AssemblyAdvanced Materials, 2013
- Highly Ordered MnO2 Nanopillars for Enhanced Supercapacitor PerformanceAdvanced Materials, 2013
- Advances in top–down and bottom–up surface nanofabrication: Techniques, applications & future prospectsAdvances in Colloid and Interface Science, 2012
- Direct writing technology—Advances and developmentsCIRP Annals, 2008
- Nanoimprint Lithography: Methods and Material RequirementsAdvanced Materials, 2007
- NIL—a low-cost and high-throughput MEMS fabrication method compatible with IC manufacturing technologyMicroelectronics Journal, 2006
- New Approaches to Nanofabrication: Molding, Printing, and Other TechniquesChemical Reviews, 2005
- Recent progress in nanoimprint technology and its applicationsJournal of Physics D: Applied Physics, 2004
- Fabrication of continuous-relief micro-optical elements by direct laser writing in photoresistsOptical Engineering, 1994